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How to Draft Claims in view of Patent Litigation in China --- Really Effective Patent Protection ---- This seminar covers the following 5 points briefly. 1) Functional features This topic will involve an introduction to the latest judicial interpretations on functional features, the relevant differences between the practices in China and US, and suggestions on drafting and prosecution of Chinese patents with functional features. 2) Indirect infringement This topic will involve an introduction to the practices in China regarding indirect infringement, a relevant case with SONY 1 or 2 as defendant and suggestions on drafting and prosecution of Chinese patents. 3) Process claims This topic will involve a case regarding the order of the steps in process claim, and suggestions on drafting and prosecution of process patents. 4) Amendment to post-grant claims This topic will involve an introduction to the latest revision of the Chinese Guidelines of Examination of Patent Application regarding amendment to claims at request for invalidation stage, and relevant suggestions. 5) Latest updates on Markush claims This topic will involve one or two latest cases about the construing of Markush claims under the practice in China, and some insights from the cases. The talk includes some example cases such that attendees may actually utilize the contents for confronting patent dispute. The seminar will be given in English. Ms. Zhang Minghui may help attendees understand the presentation in Japanese. Mr. Aikawa will be a moderator. Lecturer Mr. Wei Dong, Esq. Lecturer Mr. Ryan Xie, Esq. Firm : P.C.& Associates Sponsor: Orion International Patent Office - Ikebukuro Reservation is required. Please contact Mr. Aikawa. DATE: January 22, 2018 (Mon) from 6:30pm to 8:30pm Venue: JPAA (next to JPO) B1, Conference AB Costs: None |
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